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Sacrificial etching of III - V compounds for micromechanical devices

1996; IOP Publishing; Volume: 6; Issue: 4 Linguagem: Inglês

10.1088/0960-1317/6/4/003

1361-6439

Klas Hjort,

Photonic and Optical Devices

Sacrificial etching of III - V compounds is reviewed with emphasis on its use in surface micromachining of micromechanical structures. A table is presented with 23 different combinations of stopping layers, sacrificial layers, and etchants for sacrificial etching of GaAs- and InP-based epitaxial heterostructures. Examples of surface micromachined microstructures of III - V compounds are shown, and some possible applications are discussed.