Graphene Oxide as a Monoatomic Blocking Layer
2012; American Chemical Society; Volume: 6; Issue: 9 Linguagem: Inglês
10.1021/nn302628q
ISSN1936-086X
AutoresSøren Petersen, Magni Glyvradal, Peter Bøggild, Wenping Hu, R. Feidenhans’l, Bo W. Laursen,
Tópico(s)Advancements in Battery Materials
ResumoMonolayer graphene oxide (mGO) is shown to effectively protect molecular thin films from reorganization and function as an atomically thin barrier for vapor-deposited Ti/Al metal top electrodes. Fragile organic Langmuir–Blodgett (LB) films of C22 fatty acid cadmium salts (cadmium(II) behenate) were covered by a compressed mosaic LB film of mGO flakes. These hybrid LB films were examined with atomic force microscopy (AFM) and X-ray reflectivity, both with and without the metal top electrodes. While the AFM enabled surface and morphology analysis, the X-ray reflectivity allowed for a detailed structural depth profiling of the organic film and mGO layer below the metal top layers. The structure of the mGO-protected LB films was found to be perfectly preserved; in contrast, it has previously been shown that metal deposition completely destroys the first two LB layers of unprotected films. This study provides clear evidence of the efficient protection offered by a single atomic layer of GO.
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