Antifungal drugs as corrosion inhibitors for aluminium in 0.1M HCl
2009; Elsevier BV; Volume: 51; Issue: 8 Linguagem: Inglês
10.1016/j.corsci.2009.05.017
ISSN1879-0496
AutoresI.B. Obot, N.O. Obi-Egbedi, Savıour A. Umoren,
Tópico(s)Anodic Oxide Films and Nanostructures
ResumoThe inhibitive capabilities of Clotrimazole (CTM) and Fluconazole (FLC), two antifungal drugs, on the electrochemical corrosion of aluminium in 0.1 M HCl solution has been studied using weight loss measurements at 30 and 50 °C. The results indicate that both compound act as inhibitors in the acidic corrodent. At constant acid concentration, the inhibition efficiency (%I) increased with increase in the concentration of the inhibitors. Increase in temperature increased the corrosion rate in the absence and presence of the inhibitors but decreased the inhibition efficiency. CTM and FLC adsorbed on the surface of aluminium according to the Langmuir adsorption isotherm model at all the concentrations and temperatures studied. Phenomenon of physical adsorption is proposed from the activation parameter obtained. Thermodynamic parameters reveal that the adsorption process is spontaneous. The reactivity of these compounds was analyzed through theoretical calculations based on AM1 semi-empirical method to explain the different efficiencies of these compounds as corrosion inhibitors. CTM was found to be a better inhibitor than FLC.
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