Plasma source ion implantation: applications in metal forming
1999; Maney Publishing; Volume: 15; Issue: 3 Linguagem: Inglês
10.1179/026708499101516542
ISSN1743-2944
AutoresC.H. Leung, Alaa A. Elmoursi, Gerard W. Malaczynski, Adel Hamdi, J. V. Mantese, Carlton E. Speck,
Tópico(s)Ion-surface interactions and analysis
ResumoThe use of ion implantation to modify surface properties has always been considered too expensive in the metals industry. However, with the advent of plasma source ion implantation (PSII) the economics can be improved, especially when coupled with the highly desirable properties associated with diamondlike carbon (DLC) and many carbide and nitride coatings. The use of PSII to grow DLC films on aluminium alloys, to form hard coatings such as vanadium carbide on forming tools and die casting tools, and to nitrogen implant steel forming tools and chromium plate is reported in this paper. The commercialisation of PSII is the goal of the Advanced Technology Program with over 17 participating members, including national laboratories, corporate research centres, end users, equipment manufacturers, system component suppliers and integrators, and process providers. This multidiscipline cooperation has resulted in more effective research and development of coatings and commercial products, along with easier adaptation of processes and deployment of PSII.
Referência(s)