New aspects in Volmer-Weber 3D growth: an XPS intensity study applied to thin films of Au and Ce on polypropylene
1994; Elsevier BV; Volume: 314; Issue: 1 Linguagem: Inglês
10.1016/0039-6028(94)90209-7
ISSN1879-2758
AutoresManfred Heuberger, Giovanni Dietler, L. Schlapbach,
Tópico(s)Semiconductor materials and devices
ResumoA new method of analyzing X-ray photoelectron spectroscopy or Auger electron spectroscopy intensity data is proposed, which allows an easy distinction between the established growth modes (Frank-van der Merwe, Stranski-Krastanov, Volmer-Weber) of thin films. The method, applied to thin films of Au or Ce on polypropylene (PP), reveals detailed information about the growth mode. For Ce one observes Volmer-Weber growth at fixed substrate coverage, while for the less reactive gold, the film growth is island-like. The different chemical reactivity of the two metals towards PP is the probable cause for the film growth mode.
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