A spatially resolved optical emission sensor for plasma etch monitoring
1997; American Institute of Physics; Volume: 71; Issue: 11 Linguagem: Inglês
10.1063/1.119938
ISSN1520-8842
AutoresSteven Shannon, James Paul Holloway, Kirk Flippo, M.L. Brake,
Tópico(s)Ion-surface interactions and analysis
ResumoA spatially resolved optical emission spectroscopy sensor has been developed, and the resulting reconstructed radial emission profiles from an ArI and ArII line compare well with Ar sputter etch uniformity profiles. The new sensor collects light from a wedge shaped field of view, and is rotated around a single collection point in order to observe the entire plasma through a relatively small viewpoint.
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