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Stabilization of p-type dopant nitrogen in BeZnO ternary alloy epitaxial thin films

2012; Institute of Physics; Volume: 45; Issue: 45 Linguagem: Inglês

10.1088/0022-3727/45/45/455101

1361-6463

Mingming Chen, Rong Xiang, Longxing Su, Quanlin Zhang, Jiashi Cao, Yuan Zhu, Xuchun Gui, Tianzhun Wu, Zikang Tang,

Copper-based nanomaterials and applications

Abstract We demonstrate the growth of Be x Zn 1− x O alloy thin films on c-sapphire substrates by plasma-assisted molecular beam epitaxy. The formation of Be x Zn 1− x O is very sensitive to the Be content in the alloy. Be atoms occupy the Zn lattice sites at low Be content, but move partly to the interstitial sites with increasing Be content. We also investigated the thermal stability of N, one of the most frequently used p-type dopants, in the Be x Zn 1− x O films. Secondary ion mass spectrometry shows that Be element plays a crucial role in stabilizing N in the Be x Zn 1− x O host, which is favourable in improving the solid solubility and the thermal stability of acceptor dopants in ZnO-based wide-gap semiconductors.