Xenon excited state density measurements in electron beam pumped XeCl laser mixtures
1987; American Institute of Physics; Volume: 51; Issue: 24 Linguagem: Inglês
10.1063/1.98319
ISSN1520-8842
AutoresFumihiko Kannari, W. D. Kimura, J. F. Seamans, Dean R. Guyer,
Tópico(s)Spectroscopy and Laser Applications
ResumoTime-dependent density measurements of the lowest xenon excited states (5p56s) in electron beam (e-beam) pumped XeCl laser mixtures (nonlasing) are performed using pulsed hook interferometry. The e-beam pulse length is ≊0.45 μs (full width at half-maximum) with an average excitation rate of ≊250 kW/cm3. Density differences (ΔN*) of transitions at 823.2 nm (6s[3/2]02 –6p[3/2]2), 828.0 nm (6s[3/2]01 –6p[1/2]0), and 840.9 nm (6s[3/2]02 –6p[3/2]1) are obtained for various HCl and Xe concentrations. For a 98.3% Ne/1.5% Xe/0.16% HCl mixture at 3000 Torr, ΔN* (823.2 nm) and ΔN*(828.0 nm) are relatively constant at ≊3×1014 and ≊1.7×1014 cm−3, respectively. At lower initial HCl concentrations, the ΔN*(823.2 nm) density starts out similar to the 0.16% HCl case, but tends to increase dramatically during the e-beam pulse. For a 0.04% HCl mixture, a ΔN*(840.9 nm) density of ≊4.5×1015 cm−3 is measured at the end of the e-beam pulse. Preliminary comparisons of the data with a computer model show good agreement for HCl concentrations ≥0.16%, but disagreements at leaner concentrations.
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