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Photoluminescent Silicon Clusters in Oriented Hexagonal Mesoporous Silica Film

1999; Volume: 11; Issue: 6 Linguagem: Inglês

10.1002/(sici)1521-4095(199904)11

1521-4095

Ömer Dag, Geoffrey A. Ozin, Hong Yang, Christian Reber, Guillaume Bussière,

Catalytic Processes in Materials Science

Advanced MaterialsVolume 11, Issue 6 p. 474-480 Communication Photoluminescent Silicon Clusters in Oriented Hexagonal Mesoporous Silica Film Ömer Dag, Ömer Dag Materials Chemistry Research Group, Lash Miller Chemical Laboratories, University of Toronto, 80 St. George Street, Toronto, Ontario, M5S 3H6 (Canada)Search for more papers by this authorGeoffrey A. Ozin, Geoffrey A. OzinSearch for more papers by this authorHong Yang, Hong Yang Materials Chemistry Research Group, Lash Miller Chemical Laboratories, University of Toronto, 80 St. George Street, Toronto, Ontario, M5S 3H6 (Canada)Search for more papers by this authorChristian Reber, Christian Reber Department of Chemistry, University of Montreal, Montreal, Quebec, H3C 3J7 (Canada)Search for more papers by this authorGuillaume Bussière, Guillaume Bussière Department of Chemistry, University of Montreal, Montreal, Quebec, H3C 3J7 (Canada)Search for more papers by this author Ömer Dag, Ömer Dag Materials Chemistry Research Group, Lash Miller Chemical Laboratories, University of Toronto, 80 St. George Street, Toronto, Ontario, M5S 3H6 (Canada)Search for more papers by this authorGeoffrey A. Ozin, Geoffrey A. OzinSearch for more papers by this authorHong Yang, Hong Yang Materials Chemistry Research Group, Lash Miller Chemical Laboratories, University of Toronto, 80 St. George Street, Toronto, Ontario, M5S 3H6 (Canada)Search for more papers by this authorChristian Reber, Christian Reber Department of Chemistry, University of Montreal, Montreal, Quebec, H3C 3J7 (Canada)Search for more papers by this authorGuillaume Bussière, Guillaume Bussière Department of Chemistry, University of Montreal, Montreal, Quebec, H3C 3J7 (Canada)Search for more papers by this author First published: 30 April 1999 https://doi.org/10.1002/(SICI)1521-4095(199904)11:6 3.0.CO;2-ICitations: 77AboutPDF ToolsRequest permissionExport citationAdd to favoritesTrack citation ShareShare Give accessShare full text accessShare full-text accessPlease review our Terms and Conditions of Use and check box below to share full-text version of article.I have read and accept the Wiley Online Library Terms and Conditions of UseShareable LinkUse the link below to share a full-text version of this article with your friends and colleagues. Learn more.Copy URL Abstract The synthesis of ca. 1 nm diameter photoluminescent silicon nanoclusters in the surfactant-containing channels of a free-standing, oriented hexagonal mesoporous silica film is reported. The preparation involves an exceptionally mild disilane CVD procedure (see Fig.), during which the surfactants are intentionally retained within the channels during CVD, thus restricting the space in which the silicon clusters nucleate and grow. References 1 L. T. Canham, Appl. Phys. Lett. 1990, 57, 1046. 2 V. Lehmann, U. Gösele, Appl. Phys. Lett. 1990, 58, 856. 3 J. M. Jasinski, F. K. LeGoues, Chem. Mater. 1991, 3, 989. 4 W. A. Saunders, P. C. Sercel, R. B. Lee, H. A. Atwater, K. J. Vahala, R. C. Flagan, E. J. Escorcia-Arpacio Appl. Phys. Lett. 1993, 63, 1549. 5 K. A. Littau, P. J. Szajowski, A. J. Muller, A. R. Kortan, L. E. Brus, J. Phys. Chem. 1993, 97, 1224. 6 Y. Kanemitsu, K. Suzuki, H. Uto, Y. Masumoto, T. Matsumoto, S. Kyushin, K. Higuchi, H. Matsumoto, Appl. Phys. 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