Copper intercalation in 1T-TaS2
1991; Elsevier BV; Volume: 251-252; Linguagem: Inglês
10.1016/0039-6028(91)91059-7
ISSN1879-2758
AutoresC. Pettenkofer, Wolfram Jaegermann, B. A. Parkinson,
Tópico(s)Chalcogenide Semiconductor Thin Films
ResumoCu evaporated onto the (0001) cleavage plane of 1T-TaS2 is completely intercalated into the layered compound as a Cu(I) species. Even for higher doses no metallic overiayer is observed. The nearly commensurate √13 × √13 superstructure due to periodic lattice distortions is transformed into a 3 × 3 superstructure. In the UP-spectra of the intercalation compound the opening of a small gap at the valence band edge is observed. The metal to semiconductor transition at 180 K is lost for the intercalation compound.
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