DEPOSITION OF DLC FILMS USING MAGNETRON PLASMA IN AN UNBALANCED MAGENTIC FIELD
2000; World Scientific; Volume: 14; Issue: 02n03 Linguagem: Inglês
10.1142/s0217979200000133
ISSN1793-6578
AutoresShigehiko Fujimaki, H. Kashiwase, Y. Kokaku, T. Ohno, Yuki Honda, Hiroshi Inaba,
Tópico(s)Plasma Diagnostics and Applications
ResumoA new type of unbalanced magnetic field for planer magnetron cathode was applied to conduct PE-CVD by the assistance of dc magnetron discharge. A carbon thin carbon was formed on a negatively biased substrated by supplying Ar and CH 4 . This coating was found to have the physical properties equivalent to the DLC sample by ECR-CVD. This paper describes the sample and efficient DLC coating method based on the PE-CVD mechanism.
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