Artigo Revisado por pares

DEPOSITION OF DLC FILMS USING MAGNETRON PLASMA IN AN UNBALANCED MAGENTIC FIELD

2000; World Scientific; Volume: 14; Issue: 02n03 Linguagem: Inglês

10.1142/s0217979200000133

ISSN

1793-6578

Autores

Shigehiko Fujimaki, H. Kashiwase, Y. Kokaku, T. Ohno, Yuki Honda, Hiroshi Inaba,

Tópico(s)

Plasma Diagnostics and Applications

Resumo

A new type of unbalanced magnetic field for planer magnetron cathode was applied to conduct PE-CVD by the assistance of dc magnetron discharge. A carbon thin carbon was formed on a negatively biased substrated by supplying Ar and CH 4 . This coating was found to have the physical properties equivalent to the DLC sample by ECR-CVD. This paper describes the sample and efficient DLC coating method based on the PE-CVD mechanism.

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