Artigo Acesso aberto Revisado por pares

o -Nitrophenylethylene Glycol: a Photosensitive Protecting Group for Aldehydes and Ketones

1974; NRC Research Press; Volume: 52; Issue: 1 Linguagem: Inglês

10.1139/v74-030

ISSN

1480-3291

Autores

Jacques Hébert, Denis Gravel,

Tópico(s)

Radical Photochemical Reactions

Resumo

o-Nitrophenylethylene glycol (1) was synthesized and found to be useful as a photochemically labile blocking group for aldehydes and ketones. The acetals obtained are cleaved smoothly upon irradiation at 3500 Å, regenerating the parent carbonyl compound in very good yield.

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