Quantification and measurement by Auger electron spectroscopy and X-ray photoelectron spectroscopy
1986; Elsevier BV; Volume: 36; Issue: 7-9 Linguagem: Inglês
10.1016/0042-207x(86)90216-2
ISSN1879-2715
Autores Tópico(s)Surface and Thin Film Phenomena
ResumoOf the surface analysis techniques currently in use, AES and XPS have the greatest cumulative data and the highest quantitative accuracy. However, many problems still exist and factors of two or more in error can occur in published work due to use of the wrong or inappropriate equations. In this review we shall cover the characterization of the electron spectrometer to enable results from one instrument to be compared with those from another, the calculations of basic contributions to the intensity to quantify the result, and the expression of the result for various types of sample, for instance adsorbed monolayers, surface nuclei, reaction layers, thin films, inhomogeneous layers, etc. In the study of technological problems the structure of the sample is often unknown and additional information from the spectral background or the angular dependence of intensities must be obtained. In this way, procedures may be evolved to express quantitative results in relation to a clear model with traceable data.
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