Binary phase digital reflection holograms: fabrication and potential applications
1977; Optica Publishing Group; Volume: 16; Issue: 2 Linguagem: Inglês
10.1364/ao.16.000413
ISSN0003-6935
AutoresNeal C. Gallagher, John C. Angus, Frederick E. Coffield, Robert V. Edwards, J. Adin Mann,
Tópico(s)Photonic and Optical Devices
ResumoA novel technique for the fabrication of binary-phase computer-generated reflection holograms is described. By use of integrated circuit technology, the holographic pattern is etched into a silicon wafer and then aluminum coated to make a reflection hologram. Because these holograms reflect virtually all the incident radiation, they may find application in machining with high-power lasers. A number of possible modifications of the hologram fabrication procedure are discussed.
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