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Monte Carlo simulation of focused helium ion beam induced deposition

2010; IOP Publishing; Volume: 21; Issue: 17 Linguagem: Inglês

10.1088/0957-4484/21/17/175302

1361-6528

Daryl A. Smith, David C. Joy, Philip D. Rack,

Mass Spectrometry Techniques and Applications

The details of a Monte Carlo helium ion beam induced deposition simulation are introduced and initial results for reaction rate and mass transport limited growth regimes are presented. Reaction rate limited growth leads to fast vertical growth from incident primary ions and minimal lateral broadening, whereas mass transport limited growth has lower vertical growth velocity and exhibits broadening due to scattered ions and secondary electrons. The results are compared to recent experiments and previous electron beam induced deposition simulations.