Visible Photoluminescence in Carbon-Implanted Thermal SiO2 Films
1998; Wiley; Volume: 168; Issue: 2 Linguagem: Inglês
10.1002/(sici)1521-396x(199808)168
ISSN1521-396X
AutoresYi Yu, Yi Yu, S.P. Wong, I. H. Wilson,
Tópico(s)Nanowire Synthesis and Applications
ResumoThe structures formed after the implantation of carbon in thermal SiO2 and annealing presented visible photoluminescence (PL) bands at room temperature. The peak and intensity of PL bands depended strongly on the temperature of annealing. In addition, very weak PL bands were observed after the implantation of argon in thermal SiO2 and similar annealing. HRTEM was also used to characterize the microstructure of the carbon or argon implanted thermal SiO2 films. These observations showed that carbon aggregates were probably the origin of visible PL bands.
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