Yttria stabilized zirconia transparent films prepared by chemical vapor deposition
1989; Elsevier BV; Volume: 94; Issue: 4 Linguagem: Inglês
10.1016/0022-0248(89)90120-6
ISSN1873-5002
AutoresHisanori Yamane, Toshio Hirai,
Tópico(s)Perovskite Materials and Applications
ResumoYttria stabilized zirconia (YSZ) transparent films were prepared on quartz glass substrates at the temperature of 1375 K under atmospheric pressure using ZrCl4, YCl3 and O2 gases as source materials. The growth rate of the film thickness was 1.5 to 2.0 μm/h. Cubic YSZ films were obtained at the value of x between 20 to 60, where x is defined by x(wt%) = YCl3×100/(YCl3+ZrCl4). The lattice parameter of the cubic YSZ increased from 5.14 to 5.19 Å with the increase of x. Transparent films were obtained at the interval where the x value was between 20 to 45. The (100) plane of YSZ is oriented parallel to the surface of the substrate. For transparent film obtained at x = 29 (1.5 μm in thickness) the optical transmittance was 50–70% in the wavelength range of 250–800 nm.
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