The morphology and structure of chemically vapour-deposited Ti(C,N) coatings
1987; Elsevier BV; Volume: 146; Issue: 1 Linguagem: Inglês
10.1016/0040-6090(87)90338-5
ISSN1879-2731
AutoresDuen-Jen Cheng, Wen-Pin Sun, Min‐Hsiung Hon,
Tópico(s)Metallurgical and Alloy Processes
ResumoThin films of Ti(C,N) were prepared by chemical vapour deposition onto cemented tungsten carbide substrates. It was found that the growth rate of the Ti(C,N) coatings increased with the total flow rate of the reactant gas and with the deposition temperature. The microstructure and morphology of the Ti(C,N) coatings vary with their deposition temperature and composition. The composition of the Ti(C,N) determines the extent of the secondary growth features, and the characteristic morphology of the Ti(C,N) coatings is determined by the deposition temperature. It is also shown that the lattice constant of the Ti(C,N) coatings increases with the carbon content of the coatings.
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