Nanolithography based on an atom pinhole camera
2009; IOP Publishing; Volume: 20; Issue: 23 Linguagem: Inglês
10.1088/0957-4484/20/23/235301
ISSN1361-6528
AutoresPavel N. Melentiev, A. V. Zablotskiy, Д. А. Лапшин, E.P. Sheshin, A. S. Baturin, V. I. Balykin,
Tópico(s)Nanowire Synthesis and Applications
ResumoIn modern experimental physics the pinhole camera is used when the creation of a focusing element (lens) is difficult. We have experimentally realized a method of image construction in atom optics, based on the idea of an optical pinhole camera. With the use of an atom pinhole camera we have built an array of identical arbitrary-shaped atomic nanostructures with the minimum size of an individual nanostructure element down to 30 nm on an Si surface. The possibility of 30 nm lithography by means of atoms, molecules and clusters has been shown.
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