Gas-dependent bandgap and electrical conductivity of Cu2O thin films
2012; Elsevier BV; Volume: 108; Linguagem: Inglês
10.1016/j.solmat.2012.05.010
ISSN1879-3398
AutoresLiangmin Zhang, Lyndsey McMillon‐Brown, Jeremiah McNatt,
Tópico(s)Electronic and Structural Properties of Oxides
ResumoCuprous oxide (Cu2O) is a promising earth-abundant semiconductor for photovoltaic applications. Developing an understanding of the p-type conduction mechanism is vital to optimize the material. We have used a reactive magnetron sputtering system to fabricate Cu2O thin films. The bandgap, refractive index, mobility, density of hole, and electrical conductivity in the films have also been investigated. Our work shows that the films fabricated under nitrogen-rich condition exhibit wide bandgaps and low electrical conductivities while the films deposited under oxygen-rich condition have narrow bandgaps and high electrical conductivities. The results from the density functional theory are introduced to explain the gas dependence of the bandgap. A developed theoretical model based on Fermi-Dirac statistics shows that the high electrical conductivities originate from the acceptor levels located below Feimi level in the film.
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