Artigo Revisado por pares

Photolithography system with liquid crystal display as active gray-tone mask for 3D structuring of photoresist

2008; Elsevier BV; Volume: 144; Issue: 2 Linguagem: Inglês

10.1016/j.sna.2008.02.014

ISSN

1873-3069

Autores

Terutake Hayashi, Takayuki Shibata, Takahiro Kawashima, Eiji Makino, Takashi Mineta, Toru Masuzawa,

Tópico(s)

Image Processing Techniques and Applications

Referência(s)
Altmetric
PlumX