Photolithography system with liquid crystal display as active gray-tone mask for 3D structuring of photoresist
2008; Elsevier BV; Volume: 144; Issue: 2 Linguagem: Inglês
10.1016/j.sna.2008.02.014
ISSN1873-3069
AutoresTerutake Hayashi, Takayuki Shibata, Takahiro Kawashima, Eiji Makino, Takashi Mineta, Toru Masuzawa,
Tópico(s)Image Processing Techniques and Applications
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