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Influence of substrate misorientation on defect and impurity incorporation in GaAs/AlGaAs heterostructures grown by molecular-beam epitaxy

1988; American Institute of Physics; Volume: 63; Issue: 10 Linguagem: Inglês

10.1063/1.340412

1520-8850

D.C. Radulescu, G. W. Wicks, W. J. Schaff, A. R. Calawa, L.F. Eastman,

Semiconductor materials and devices

GaAs/AlGaAs heterostructures have been grown by molecular-beam epitaxy on GaAs substrates intentionally oriented (tilted) a few degrees (0–6.5) off the (001) plane towards either (111)A, (111)B, or (011). We observe that the 4-K photoluminescence and low-field electron transport properties of these structures may be functions of the substrate tilt angle and tilt direction depending on the concentration of impurities incorporated during growth. A substrate tilt during molecular-beam epitaxy is observed to have the largest effect on these properties when the background impurity concentration in the molecular-beam epitaxial machine is high. This supports our contention that the observed changes in material characteristics are due to differences in the incorporation of defects and impurities. The incorporation of defects and impurities are reduced by using substrates tilted toward (111)A in comparison to nominally flat (001) substrates or substrates tilted toward (111)B.