Portal de Periódicos da CAPES

Rolling mask nanolithography: the pathway to large area and low cost nanofabrication

2012; SPIE; Volume: 8249; Linguagem: Inglês

10.1117/12.910158

1996-756X

Boris Kobrin, Edward S. Barnard, Mark L. Brongersma, Moon K. Kwak, L. Jay Guo,

Metal and Thin Film Mechanics

The demand for large area and low cost nanopatterning techniques for optical coatings and photonic devices has increased at a tremendous rate. At present, it is clear that currently available nanopatterning technologies are unable to meet the required performance, fabrication-speed, or cost criteria for many applications requiring large area and low cost nanopatterning. Rolith Inc proposes to use a new nanolithography method - "Rolling mask" lithography - that combines the best features of photolithography, soft lithography and roll-to-plate printing technologies. We will report on the first results achieved on a recently built prototype tool and cylindrical mask, which was designed to pattern 300 mm wide substrate areas.