Artigo Acesso aberto Revisado por pares

A Novel Electrodeposition Process for Plating Zn-Ni-Cd Alloys

2003; Institute of Physics; Volume: 150; Issue: 2 Linguagem: Inglês

10.1149/1.1534599

ISSN

1945-7111

Autores

Hansung Kim, Branko N. Popov, Ken S. Chen,

Tópico(s)

Nanoporous metals and alloys

Resumo

Zn-Ni-Cd alloy was electrodeposited from an alkaline electrolytic bath under potentiostatic conditions. Bath analyses using a pH concentration diagram reveal that addition of a complexing agent is essential to maintain the bath stability. Introduction of a low concentration of reduces the anomalous nature of the Zn-Ni deposit. Deposits obtained from the electrolytic bath which contains 60 g/L of 40 g/L of 1 g/L of and 80 g/L of in the presence of additives and ammonium hydroxide at pH 9.3 has a composition of 50 wt % of Zn, 28 wt % of Ni, and 22 wt % of Cd. By optimizing the Cd concentration in the bath, it is possible to control the amount of Ni in the deposit. At large overpotentials, the surface of the electrode is covered with hydrogen which lowers the deposition current density. Rotating disk electrode studies indicated that the deposition of Cd is under mass control, while Ni deposition is under kinetic control. © 2003 The Electrochemical Society. All rights reserved.

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