Topas-based lab-on-a-chip microsystems fabricated by thermal nanoimprint lithography

2005; American Institute of Physics; Volume: 23; Issue: 6 Linguagem: Inglês

10.1116/1.2091089

ISSN

1520-8567

Autores

Brian Bilenberg, Mikkel Fougt Hansen, D. M. Johansen, Veysel Özkapici, Claus Jeppesen, Péter Szabó, I. Obieta, O. Arroyo, Jonas O. Tegenfeldt, Anders Kristensen,

Tópico(s)

Nanofabrication and Lithography Techniques

Resumo

We present a one-step technology for fabrication of Topas-based lab-on-a-chip (LOC) microsystems by the use of thermal nanoimprint lithography (NIL). The technology is demonstrated by the fabrication of two working devices: a particle separator and a LOC with integrated optics for absorbance measurements. These applications demonstrate the fabrication of millimeter to micrometer-sized structures in one lithographic step. The use of NIL makes the technology easily scalable into the nanometer regime by the use of a suitable lithographic technique in the fabrication of the stamp. Processing issues such as environmental stress cracking of the Topas and the requirements to anti-sticking layers on the stamp when imprinting into Topas are discussed.

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