Effects of Substrate Surface Functionality on Solution-Deposited Titania Films
2002; American Chemical Society; Volume: 14; Issue: 6 Linguagem: Inglês
10.1021/cm010776e
ISSN1520-5002
AutoresHillel Pizem, Chaim N. Sukenik, Uma Sampathkumaran, Alan K. McIlwain, Mark R. De Guire,
Tópico(s)Electrophoretic Deposition in Materials Science
ResumoLiquid-phase deposition (LPD) from aqueous solution, under mild conditions of temperature (≤55 °C) and pH (2.88−3.88), can produce thin (0.1−1.0 μm), adherent titania (TiO2) films. This paper reports a systematic study of LPD TiO2 films on variously prepared silicon wafer substrates, including (to our knowledge for the first time with LPD) several types of sulfonated surfaces (including sulfonated self-assembled monolayers and sulfonated polyelectrolyte multilayers). The growth rate and crystallinity of these films could be controlled by careful manipulation of solution parameters and surface functionality of the substrate.
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