Ultrafast electron diffraction at surfaces after laser excitation
2006; Elsevier BV; Volume: 600; Issue: 18 Linguagem: Inglês
10.1016/j.susc.2006.02.070
ISSN1879-2758
AutoresA. Janzen, B. Krenzer, Ping Zhou, D. von der Linde, M. Horn‐von Hoegen,
Tópico(s)nanoparticles nucleation surface interactions
ResumoUltrafast electron diffraction in a RHEED setup is used to determine the dynamics of surface temperature of an epitaxial thin Bismuth-film on a Si(0 0 1) substrate upon fs-laser excitation. A transient temperature rise by 120 K is followed by a slow exponential cooling with time constant 640 ps. The surface cooling rate deviates from simple heat diffusion and is dominated by total internal reflection of ballistic phonons at the Bi/Si-interface which determines the thermal properties of the hetero-system.
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