Measurement of surface-plasmon dispersion in oxidized aluminum films
1975; American Physical Society; Volume: 11; Issue: 8 Linguagem: Inglês
10.1103/physrevb.11.3116
ISSN0556-2805
AutoresR. B. Pettit, J. Silcox, R. Vincent,
Tópico(s)Advancements in Photolithography Techniques
ResumoA 75-keV electron beam with a low angular divergence (8 \ifmmode\times\else\texttimes\fi{} ${10}^{\ensuremath{-}6}$ rad) combined with a Wien filter spectrometer is used to measure the dispersion of the ${\ensuremath{\omega}}^{+}$ and ${\ensuremath{\omega}}^{\ensuremath{-}}$ modes for suface plasmons in thin oxidized aluminum films. The results for normal incidence and for tilted films are self-consistent and are also in reasonable agreement with theoretical curves calculated for a 35- to 40-\AA{} oxide layer, provided resonable assumptions are made about the composition and dielectric constants of the aluminum oxide.
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