Surface characterization study of InP(100) substrates using ion-scattering spectroscopy, Auger electron spectroscopy and electron spectroscopy for chemical analysis I: Comparison of substrate-cleaning techniques
1991; Elsevier BV; Volume: 197; Issue: 1-2 Linguagem: Inglês
10.1016/0040-6090(91)90247-u
ISSN1879-2731
AutoresStuart J. Hoekje, Gar B. Hoflund,
Tópico(s)Surface and Thin Film Phenomena
ResumoA surface characterization study has been performed on native oxides formed on InP(100) surfaces after the application of various substrate-cleaning techniques; solvent cleaning, ozone etching and two different wet-chemical-etching processes. Several surface analytical techniques, including electron spectroscopy for chemical analysis (ESCA), Auger electron spectroscopy (AES) and ion-scattering spectroscopy (ISS) have been used in this study. The data obtained from the different surfaces show that these surfaces are very complex and that the compositions and chemical species present vary considerably with the substrate-cleaning technique used. ISS, AES and ESCA probe varying depths beneath the surface, so comparison of the data is essentially a non-destructive depth profile of the near-surface regions of the samples examined.
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