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Characterization of the energy flux toward the substrate during magnetron sputter deposition of ZnO thin films

2013; IOP Publishing; Volume: 22; Issue: 2 Linguagem: Inglês

10.1088/0963-0252/22/2/025019

1361-6595

Sven Bornholdt, N Itagaki, Keisuke Kuwahara, H. Wulff, Masaharu Shiratani, Holger Kersten,

Gas Sensing Nanomaterials and Sensors

The characterization of energy influxes from plasma to substrate during sputter deposition of ZnO films is presented and discussed. Measurements were carried out in a triple rf magnetron sputter deposition system using calorimetric probes in various Ar/N2 and Ar/H2 mixtures at typical substrate positions. By variation of the probe bias the different contributions originating from the kinetic energy of charge carriers, the recombination of charge carriers (electrons and ions) at the surface as well as the contributions from the impact of neutral sputtered particles and subsequent film growth were determined. Radial scans in the substrate plane were recorded to obtain information about inhomogeneities in the total energy influx.