Fabrication of Three‐Dimensional Photonic Crystals Using Multibeam Interference Lithography and Electrodeposition
2009; Volume: 21; Issue: 29 Linguagem: Inglês
10.1002/adma.200802085
ISSN1521-4095
AutoresMasao Miyake, Ying‐Chieh Chen, Paul V. Braun, Pierre Wiltzius,
Tópico(s)Plasmonic and Surface Plasmon Research
ResumoHigh-quality 3D photonic crystals are fabricated through electrodeposition into a polymer template created by multibeam interference lithography. Complete infilling of the template is achieved through electrodeposition of Cu2O, and subsequent etching of the template results in a Cu2O/air photonic crystal with the exact inverse structure of the template (see figure). The resultant photonic crystal shows a high peak reflectance at theoretically predicted wavelength.
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