The UV-nanoimprint lithography equipment with multi-head imprinting unit for sub-50nm half-pitch patterns
2007; Elsevier BV; Volume: 84; Issue: 5-8 Linguagem: Inglês
10.1016/j.mee.2007.01.079
ISSN1873-5568
AutoresJaejong Lee, Kee-Bong Choi, GeeHong Kim, Seung-Woo Lee,
Tópico(s)Microfluidic and Capillary Electrophoresis Applications
ResumoNanoimprinting lithography (NIL) is a promising technology to produce sub-50 nm half-pitch features on silicon- and/or quartz-based substrates. It is well-known as the next generation lithography. Especially, the UV-nanoimprint lithography technology has advantages of the simple process, low cost, high replication fidelity and relatively high throughput. In this paper, chip-size multi-head imprinting unit with compliance stage and overlay/alignment system with moiré and dual grating unit are proposed in order to fabricate sub-50 nm half-pitch patterns. These systems are set-up and performed in single-step nanoimprinting tool (ANT-4) which has several functional units for nanoimprinting process. Using the UV-NIL tool, 50 nm, 70 nm and 100 nm half-pitch dot and line patterns are obtained. Also, 20 nm overlay/alignment accuracy is obtained by means of the proposed method.
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