Investigation on the oxidation process of SiCO glasses by the means of non-Rutherford backscattering spectrometry
2003; Elsevier BV; Volume: 211; Issue: 3 Linguagem: Inglês
10.1016/s0168-583x(03)01322-3
ISSN1872-9584
AutoresAlberto Vomiero, Stefano Modena, Gian Domenico Sorarù, Rishi Raj, Yigal D. Blum, G. Della Mea,
Tópico(s)Ion-surface interactions and analysis
ResumoIon beam analysis was applied for the first time to characterize the oxidation process of silicon oxycarbides (SiCO) glasses (belonging to the class of polymer-derived ceramics). The technique unveiled the structure of the interface between the silica scale and the SiCO substrate. At the early oxidation stage, a smooth concentration profile was observed between the surface silica layer and the substrate. The role of the free carbon on the kinetics of the oxidation process was studied by preparing samples with different carbon content. A high amount of free C in the SiCO glasses promotes the transition, after long oxidation periods, to a sharp interface between the silica scale and the SiCO substrate.
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