Portal de Periódicos da CAPES

Elastic modulus of and residual stresses in diamond films

1995; Elsevier BV; Volume: 260; Issue: 1 Linguagem: Inglês

10.1016/0040-6090(94)06457-1

1879-2731

Chin‐Chen Chiu, Yung Liou, Juang Yung-Der,

Force Microscopy Techniques and Applications

Diamond thin films were prepared using microwave-enhanced chemical vapor deposition techniques with different concentration ratios of CH4 to H2 at temperatures of 800 °C and 900 °C. The elastic modulus of the films varies non-linearly with the change in the ratio of CH4 to H2, and is not significantly affected by changes in the process temperature. Compressive and tensile residual stresses develop in the films prepared at 800 °C and 900 °C, respectively. The magnitude of the stresses is a function of the CH4H2 ratio. An analysis of Raman spectra reveals that the quality of the films is influenced by the CH4H2 ratio.