Electronic structure of a heterostructure of an alkylsiloxane self-assembled monolayer on silicon

1998; American Physical Society; Volume: 58; Issue: 24 Linguagem: Inglês

10.1103/physrevb.58.16491

ISSN

1095-3795

Autores

D. Vuillaume, C. Boulas, J. Collet, G. Allan, Christophe Delerue,

Tópico(s)

Force Microscopy Techniques and Applications

Resumo

We report on the experimental and theoretical determination of the energy offsets between a silicon substrate and a monolayer of alkyl chains chemically grafted on it (self-assembly technique). Internal photoemission experiments show that energy offsets between the silicon conduction band and the lowest unoccupied molecular orbital are 4.1--4.3 eV. Similarly, the energy offsets between the silicon valence band and the highest occupied molecular orbital of the alkyl chains are 4.1--4.5 eV, irrespective of the alkyl chain length (from 12 to 18 carbon atoms). These results are confirmed by theoretical calculations (the local-density approximation and tight-binding methods). These rather similar values are explained by the fact that the carbon ${\mathrm{sp}}_{3}$ level tends to align with the silicon ${\mathrm{sp}}_{3}$ level to achieve the charge neutrality and that the band structures of the carbon and silicon are almost centered on their respective ${\mathrm{sp}}_{3}$ level. These results validate the proposed concept making use of these self-assembled monolayers as ultrathin insulator in nanometer-scale electronic devices [C. Boulas et al., Phys. Rev. Lett. 76, 4797 (1997); D. Vuillaume et al., Appl. Phys. Lett. 69, 1646 (1997)].

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