193nm Lithography with Novel Highly Transparent Acid Amplifier for Chemically Amplified Resist.
1999; The Society of Photopolymer Science and Technology (SPST); Volume: 12; Issue: 3 Linguagem: Inglês
10.2494/photopolymer.12.509
ISSN1349-6336
AutoresTakuya Naito, Takeshi Ohfuji, Masayuki Endo, Hiroaki Morimoto, Koji Arimitsu, Kunihiro Ichimura,
Tópico(s)Advanced Surface Polishing Techniques
ResumoPinanediol monosulfonate derivatives were used as acid amplifiers for chemically amplified ArF resists. A highly transparent acid amplifier free of aromatics improved the sensitivity of the resist without sacrificing. the resolution. Adding this acid amplifier to an ArF resist doubled its sensitivity, and 0.15μm line-and-space patterns were resolved.
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