Modelling the Low‐Pressure N 2 O 2 Plasma Afterglow to Determine the Kinetic Mechanisms Controlling the UV Emission Intensity and Its Spatial Distribution for Achieving an Efficient Sterilization Process
2008; Wiley; Volume: 5; Issue: 9 Linguagem: Inglês
10.1002/ppap.200800085
ISSN1612-8869
AutoresKinga Kutasi, Bachir Saoudi, C. D. Pintassilgo, J Loureiro, Michel Moisan,
Tópico(s)Innovative Microfluidic and Catalytic Techniques Innovation
ResumoAbstract The flowing afterglow of a N 2 O 2 microwave discharge intended to provide intense and spatially uniform UV emission for an efficient inactivation of bacterial spores is modelled with a 3‐D hydrodynamic model leading to the spatial density distribution of the species in the reactor. The agreement of the calculated densities of the NO(A) and NO(B) UV emitting species with the corresponding measured emission intensities strongly supports the choice of the kinetic reactions retained in the model. In that respect, the specific contribution of N and O atoms to the spatial distribution of the NO(A) density (generating the NO γ system) in the late afterglow is, for the first time, brought into relief. magnified image
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