X-ray excited optical luminescence (XEOL): a potential tool for OELD studies
2000; Elsevier BV; Volume: 363; Issue: 1-2 Linguagem: Inglês
10.1016/s0040-6090(99)01006-8
ISSN1879-2731
AutoresTsun‐Kong Sham, Ramaswami Sammynaiken, Ying‐Jie Zhu, Peng Zhang, I. Coulthard, S. J. Naftel,
Tópico(s)Semiconductor materials and devices
ResumoAn X-ray excited optical luminescence (XEOL) technique using laboratory soft X-rays and synchrotron radiation in the visible-UV and soft X-ray region will be discussed. It is shown that XEOL takes advantage of the penetration power of the X-rays and the tunability of the photons from a synchrotron source. Thus XEOL provides some sampling depth and site selectivity and allows for the probing of underlayers and buried interfaces. XEOL studies of porous silicon and a poly-vinyl-carbazole film will be used to illustrate that this technique is suited for the study of organic luminescent materials and organic electroluminescence devices (OELD).
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