Oxidation of neodymium overlayers and Nd/Cu alloy thin films on Cu(100): Properties of the NdOx − Cu(100) interface
1988; Elsevier BV; Volume: 205; Issue: 1-2 Linguagem: Inglês
10.1016/0039-6028(88)90164-1
ISSN1879-2758
AutoresRoger M. Nix, Robert W. Judd, Richard M. Lambert,
Tópico(s)Advanced Materials Characterization Techniques
ResumoSurface sensitive techniques (XPS, UPS, AES, LEED and work function) have been used to characterise the oxidation of Nd overlayers and Cu-Nd alloy thin films on a Cu(100) substrate. The initial uptake of oxygen is rapid with subsurface incorporation into the Nd films at 300 K; at higher exposures the kinetics become controlled by either the reaction with copper or diffusion into the bulk of the Nd film and oxide aggregation can occur. There is evidence for the formation of an intermediate oxide prior to the growth of Nd2C3 and, whilst the oxide films obtained at 300 K are disordered, annealing to high temperatures leads to the formation of ordered oxides exhibiting various epitaxial relationships with the Cu(100) substrate.
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