Lithography of high spatial density biosensor structures with sub-100 nm spacing by MeV proton beam writing with minimal proximity effect
2003; IOP Publishing; Volume: 15; Issue: 1 Linguagem: Inglês
10.1088/0957-4484/15/1/040
ISSN1361-6528
AutoresHarry J. Whitlow, May Ling Ng, Vaida Au elyté, Ivan Maximov, Lars Montelius, J.A. van Kan, Andrew A. Bettiol, F. Watt,
Tópico(s)Nanowire Synthesis and Applications
ResumoMetal electrode structures for biosensors with a high spatial density and similar to85 nm gaps have been produced using focused megaelectronvolt (MeV) proton beam writing of poly-(methyl methacrylate) positive resist combined with metal lift-off. The minimal proximity exposure and straight proton trajectories in (similar to100 nm) resist layers for focused MeV proton beam writing are strongly indicative that ultimate electrode gap widths approaching a few nanometres are achievable.
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