Radical polymerization activity and mechanistic approach in a new three-component photoinitiating system
2000; Wiley; Volume: 38; Issue: 24 Linguagem: Inglês
10.1002/1099-0518(20001215)38
ISSN1099-0518
AutoresLaura Fouassier, Xavier Allonas, Jacques Lalevée, M. Visconti,
Tópico(s)Dental materials and restorations
ResumoJournal of Polymer Science Part A: Polymer ChemistryVolume 38, Issue 24 p. 4531-4541 Article Radical polymerization activity and mechanistic approach in a new three-component photoinitiating system J. P. Fouassier, Corresponding Author J. P. Fouassier jp.fouassier@univ-mulhouse.fr Département de Photochimie Générale, UMR No. 7525, Ecole Nationale Supérieure de Chimie, 3 rue Alfred Werner, 68093 Mulhouse Cedex, FranceDépartement de Photochimie Générale, UMR No. 7525, Ecole Nationale Supérieure de Chimie, 3 rue Alfred Werner, 68093 Mulhouse Cedex, FranceSearch for more papers by this authorX. Allonas, X. Allonas Département de Photochimie Générale, UMR No. 7525, Ecole Nationale Supérieure de Chimie, 3 rue Alfred Werner, 68093 Mulhouse Cedex, FranceSearch for more papers by this authorJ. Lalevee, J. Lalevee Département de Photochimie Générale, UMR No. 7525, Ecole Nationale Supérieure de Chimie, 3 rue Alfred Werner, 68093 Mulhouse Cedex, FranceSearch for more papers by this authorM. Visconti, M. Visconti Lamberti SpA, Chemical Specialties, via Piave 18, 21041 Albizzate, ItalySearch for more papers by this author J. P. Fouassier, Corresponding Author J. P. Fouassier jp.fouassier@univ-mulhouse.fr Département de Photochimie Générale, UMR No. 7525, Ecole Nationale Supérieure de Chimie, 3 rue Alfred Werner, 68093 Mulhouse Cedex, FranceDépartement de Photochimie Générale, UMR No. 7525, Ecole Nationale Supérieure de Chimie, 3 rue Alfred Werner, 68093 Mulhouse Cedex, FranceSearch for more papers by this authorX. Allonas, X. Allonas Département de Photochimie Générale, UMR No. 7525, Ecole Nationale Supérieure de Chimie, 3 rue Alfred Werner, 68093 Mulhouse Cedex, FranceSearch for more papers by this authorJ. Lalevee, J. Lalevee Département de Photochimie Générale, UMR No. 7525, Ecole Nationale Supérieure de Chimie, 3 rue Alfred Werner, 68093 Mulhouse Cedex, FranceSearch for more papers by this authorM. Visconti, M. Visconti Lamberti SpA, Chemical Specialties, via Piave 18, 21041 Albizzate, ItalySearch for more papers by this author First published: 02 November 2000 https://doi.org/10.1002/1099-0518(20001215)38:24 3.0.CO;2-UCitations: 46Read the full textAboutPDF ToolsRequest permissionExport citationAdd to favoritesTrack citation ShareShare Give accessShare full text accessShare full-text accessPlease review our Terms and Conditions of Use and check box below to share full-text version of article.I have read and accept the Wiley Online Library Terms and Conditions of UseShareable LinkUse the link below to share a full-text version of this article with your friends and colleagues. Learn more.Copy URL Share a linkShare onFacebookTwitterLinked InRedditWechat Abstract A new three-component photoinitiating system (based on isopropylthioxanthone ITX, amine AH, and a bifunctional benzophenone–ketosulfone BP-SK photoinitiator) for acrylate polymerization reactions was investigated through steady-state photolysis (photodegradation, redox potentials, and acidity release determinations) and time-resolved laser spectroscopy. The photopolymerization activity has been checked. It is shown that addition of ITX to BP-SK/AH clearly enhances the efficiency of the photopolymerization of clear or pigmented coatings. This is explained (although, a direct interaction between the triplet state of ITX and BP-SK occurs to some extents) on the basis of the interaction of BP-SK with the ketyl radical of ITX. © 2000 John Wiley & Sons, Inc. J Polym Sci A: Polym Chem 38: 4531–4541, 2000 Citing Literature Volume38, Issue2415 December 2000Pages 4531-4541 RelatedInformation
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