Understanding the chemical vapor deposition of diamond: recent progress
2009; IOP Publishing; Volume: 21; Issue: 36 Linguagem: Inglês
10.1088/0953-8984/21/36/364201
ISSN1361-648X
AutoresJ. E. Butler, Yu. A. Mankelevich, Andrew Cheesman, Jie Ma, Michael N. R. Ashfold,
Tópico(s)Semiconductor materials and devices
ResumoIn this paper we review and provide an overview to the understanding of the chemical vapor deposition (CVD) of diamond materials with a particular focus on the commonly used microwave plasma-activated chemical vapor deposition (MPCVD). The major topics covered are experimental measurements in situ to diamond CVD reactors, and MPCVD in particular, coupled with models of the gas phase chemical and plasma kinetics to provide insight into the distribution of critical chemical species throughout the reactor, followed by a discussion of the surface chemical process involved in diamond growth.
Referência(s)