The preparation and properties of elemental semiconductor thin films
1973; Elsevier BV; Volume: 18; Issue: 1 Linguagem: Inglês
10.1016/0040-6090(73)90215-0
ISSN1879-2731
Autores Tópico(s)ZnO doping and properties
ResumoAbstract This review surveys the preparation and properties of elemental semiconductor thin films, with particular emphasis on material for semicondutor device applications. Epitaxial film deposition techniques are described and recent advances in low temperature epitaxial silicon growth discussed. Work on epitaxial semiconductor films on insulators, and on polycrystalline and amorphous films is also reviewed.
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