Metal Organic Chemical Vapor Deposition (MOCVD) Perspectives and Prospects
1989; Wiley; Volume: 101; Issue: 8 Linguagem: Inglês
10.1002/ange.19891010853
ISSN1521-3757
Autores Tópico(s)Physics of Superconductivity and Magnetism
ResumoReview: Thin film epitaxial semiconductor structures of widely varying but controlled compositions and thickness can be prepared using MOCVD. The performance of the method is gauged against molecular beam epitaxy (MBE) and spray pyrolysis, and comment is made on the direction in which this area of research is going, for example, towards the processing of high‐ T c superconductors and ferroelectric oxides.
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