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Relationship between electron sensitivity and chemical structures of polymers as electron beam resist. VII: Electron sensitivity of vinyl polymers containing pendant 1,3‐dioxolan groups

1990; Wiley; Volume: 30; Issue: 8 Linguagem: Inglês

10.1002/pen.760300804

1548-2634

Kiyoshi Oguchi, Kohei Sanui, Naoya Ogata, Yoichi Takahashi, Tomihiro Nakada,

Electron and X-Ray Spectroscopy Techniques

Abstract Vinyl polymers containing pendant acetal groups were synthesized using (2,2‐dimethyl‐l,3‐dioxolan‐4‐yl)methyl acrylate (DMA) and (2,2‐dimethyl‐l,3‐dioxo‐lan‐4‐yl)methyl methacrylate (DMM), and were evaluated as negative electron beam (EB) resists. It was found that the EB sensitivity of polymers containing acetal groups in the side chain was higher than that of polymers containing acetal groups in the main chain. A high sensitivity of 3.6 × 10 −8 C/cm 2 was observed. Copolymers of DMA or DMM with styrene were also synthesized in order to improve the durability for dry etching process. It was found that the copolymers had an excellent dry etching durability and were adaptable to EB lithography.