Device Photolithography: The Electron Beam Pattern Generator
1970; Institute of Electrical and Electronics Engineers; Volume: 49; Issue: 9 Linguagem: Inglês
10.1002/j.1538-7305.1970.tb02514.x
ISSN2376-7154
AutoresWinston R. Samaroo, J. Raamot, Peter D. Parry, Gideon Robertson,
Tópico(s)Acoustic Wave Resonator Technologies
ResumoAn electron beam pattern generator is being developed to write directly on photographic plates with a 4-μm diameter beam over a 5-cm by 5-cm field with an address structure of 25,000 by 25,000. Two unique features of this pattern generator are random-access computer control of the beam and a 15-bit digital-to-analog converter stable to better than ±1 part in 10 6 . Capability for drawing 4-μm lines having an edge gradient less than 0.5 μm and an optical density greater than three has been demonstrated. Stability of better than ±1 μm in 24 hours over a 4-mm by 4-mm field has been achieved. Experiments still in progress have demonstrated ±1-μm stability over the entire 5-cm by 5-cm field for shorter time periods. Reticles of typical complexity are drawn routinely in less than five minutes.
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