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Film deposition by laser-induced vacuum arc evaporation

1990; Institute of Electrical and Electronics Engineers; Volume: 18; Issue: 6 Linguagem: Inglês

10.1109/27.61503

1939-9375

H.‐J. Scheibe, P. Siemroth,

Vacuum and Plasma Arcs

Recent results of a study of the deposition process and the technological development of laser-arc are presented. Studies of the influence of arc current on film deposition were carried out for Ti, TiC, and C. On the basis of these results, specific multilayered structures have been prepared. As an example, a Ti/TiC multilayer system with 25-nm single layers is described. Results of structural and chemical analysis by means of Auger electron spectroscopy (AES) are presented. They show that diamond-like carbon film with a refractive index in the range of between 2.05 and 2.5 can be deposited effectively. >