Formation of thermal decomposition cavities in physical vapor transport of silicon carbide
2000; Springer Science+Business Media; Volume: 29; Issue: 3 Linguagem: Inglês
10.1007/s11664-000-0075-7
ISSN1543-186X
AutoresEdward Sanchez, Thomas Kuhr, V.D. Heydemann, David W. Snyder, Gregory S. Rohrer, Marek Skowroński,
Tópico(s)Semiconductor materials and interfaces
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