Determination of the Density Distribution of Interface States from High- and Low-Frequency Capacitance Characteristics of the Tin/Organic Pyronine-B/p-type Silicon Structure
2002; Wiley; Volume: 3; Issue: 8 Linguagem: Inglês
10.1002/1439-7641(20020816)3
ISSN1439-7641
AutoresM. Çakar, Cabir Temırcı, A. Türüt,
Tópico(s)Silicon and Solar Cell Technologies
ResumoThe interface state energy distribution curve of the Sn/pyronine-B/p-Si Schottky diode has been obtained from its forward-bias CHF and CLF characteristics (see picture). The interface state density value rises exponentially with bias from the midgap towards the top of the valence band. The interface states and interfacial layer at the organic semiconductor/inorganic semiconductor structures play an important role in the determination of the Schottky barrier height.
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