High‐Aspect‐Ratio Imageable Top‐Surface Lithography Using UV‐Assisted Inkless Contact Printing
2009; Wiley; Volume: 6; Issue: 3 Linguagem: Inglês
10.1002/smll.200902073
ISSN1613-6829
Autores Tópico(s)Microfluidic and Capillary Electrophoresis Applications
ResumoSmallVolume 6, Issue 3 p. 371-375 Communication High-Aspect-Ratio Imageable Top-Surface Lithography Using UV-Assisted Inkless Contact Printing Se-Jin Choi, Corresponding Author Se-Jin Choi [email protected] Minuta Tech. Co., Ltd. R&D Center Seongnam, Gyeonggi-Do 513-15 (Korea)Minuta Tech. Co., Ltd. R&D Center Seongnam, Gyeonggi-Do 513-15 (Korea).Search for more papers by this authorJeong-Yong Park, Jeong-Yong Park Semiconductor Division, Samsung Electronics Corporation Yougin, Gyeonggi-Do 446-711 (Korea)Search for more papers by this author Se-Jin Choi, Corresponding Author Se-Jin Choi [email protected] Minuta Tech. Co., Ltd. R&D Center Seongnam, Gyeonggi-Do 513-15 (Korea)Minuta Tech. Co., Ltd. R&D Center Seongnam, Gyeonggi-Do 513-15 (Korea).Search for more papers by this authorJeong-Yong Park, Jeong-Yong Park Semiconductor Division, Samsung Electronics Corporation Yougin, Gyeonggi-Do 446-711 (Korea)Search for more papers by this author First published: 27 January 2010 https://doi.org/10.1002/smll.200902073Citations: 5Read the full textAboutPDF ToolsRequest permissionExport citationAdd to favoritesTrack citation ShareShare Give accessShare full text accessShare full-text accessPlease review our Terms and Conditions of Use and check box below to share full-text version of article.I have read and accept the Wiley Online Library Terms and Conditions of UseShareable LinkUse the link below to share a full-text version of this article with your friends and colleagues. Learn more.Copy URL Share a linkShare onFacebookTwitterLinkedInRedditWechat Graphical Abstract The simple production of micro/nanoscale patterns with very high aspect ratios exceeding that of the mold used is demonstrated using unconventional top-surface lithography. The method combines inkless contact printing and subsequent dry pattern development by oxygen reactive ion etching (see image), making it possible to form high-resolution, high-aspect-ratio patterns without the aid of expensive optical protocols. Citing Literature Supporting Information Detailed facts of importance to specialist readers are published as "Supporting Information". Such documents are peer-reviewed, but not copy-edited or typeset. They are made available as submitted by the authors. Filename Description smll_200902073_sm_suppdata.pdf260.3 KB suppdata Please note: The publisher is not responsible for the content or functionality of any supporting information supplied by the authors. Any queries (other than missing content) should be directed to the corresponding author for the article. Volume6, Issue3February 5, 2010Pages 371-375 RelatedInformation
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